Microprocessor.
Publié le 11/05/2013
Extrait du document
«
thin layer of oxide about 75 angstroms deep (an angstrom is one ten-billionth of a meter).
Nearly every layer that is deposited on the wafer must be patterned accurately into the shape of the transistors and other electronic elements.
Usually this is done in aprocess known as photolithography, which is analogous to transforming the wafer into a piece of photographic film and projecting a picture of the circuit on it.
A coatingon the surface of the wafer, called the photoresist or resist, changes when exposed to light, making it easy to dissolve in a developing solution.
These patterns are assmall as 0.13 microns in size.
Because the shortest wavelength of visible light is about 0.5 microns, short-wavelength ultraviolet light must be used to resolve the tinydetails of the patterns.
After photolithography, the wafer is etched—that is, the resist is removed from the wafer either by chemicals, in a process known as wetetching, or by exposure to a corrosive gas, called a plasma, in a special vacuum chamber.
In the next step of the process, ion implantation, also called doping, impurities such as boron and phosphorus are introduced into the silicon to alter its conductivity.This is accomplished by ionizing the boron or phosphorus atoms (stripping off one or two electrons) and propelling them at the wafer with an ion implanter at very highenergies.
The ions become embedded in the surface of the wafer.
The thin layers used to build up a microprocessor are referred to as films.
In the final step of the process, the films are deposited using sputterers in which thin films aregrown in a plasma; by means of evaporation, whereby the material is melted and then evaporated coating the wafer; or by means of chemical-vapor deposition,whereby the material condenses from a gas at low or atmospheric pressure.
In each case, the film must be of high purity and its thickness must be controlled within asmall fraction of a micron.
Microprocessor features are so small and precise that a single speck of dust can destroy an entire die.
The rooms used for microprocessor creation are called cleanrooms because the air in them is extremely well filtered and virtually free of dust.
The purest of today's clean rooms are referred to as class 1, indicating that there isno more than one speck of dust per cubic foot of air.
(For comparison, a typical home is class one million or so.)
VII HISTORY OF THE MICROPROCESSOR
The first microprocessor was the Intel 4004, produced in 1971.
Originally developed for a calculator, and revolutionary for its time, it contained 2,300 transistors on a 4-bit microprocessor that could perform only 60,000 operations per second.
The first 8-bit microprocessor was the Intel 8008, developed in 1972 to run computerterminals.
The Intel 8008 contained 3,300 transistors.
The first truly general-purpose microprocessor, developed in 1974, was the 8-bit Intel 8080 ( see Microprocessor, 8080), which contained 4,500 transistors and could execute 200,000 instructions per second.
By 1989, 32-bit microprocessors containing 1.2 million transistors andcapable of executing 20 million instructions per second had been introduced.
In the 1990s the number of transistors on microprocessors continued to double nearly every 18 months.
The rate of change followed an early prediction made byAmerican semiconductor pioneer Gordon Moore.
In 1965 Moore predicted that the number of transistors on a computer chip would double every year, a prediction thathas come to be known as Moore’s Law.
In the mid-1990s chips included the Intel Pentium Pro, containing 5.5 million transistors; the UltraSparc-II, by SunMicrosystems, containing 5.4 million transistors; the PowerPC620, developed jointly by Apple, IBM, and Motorola, containing 7 million transistors; and the DigitalEquipment Corporation's Alpha 21164A, containing 9.3 million transistors.
By the end of the decade microprocessors contained many millions of transistors, transferred64 bits of data at once, and performed billions of instructions per second.
Contributed By:Gary H.
BernsteinMicrosoft ® Encarta ® 2009. © 1993-2008 Microsoft Corporation.
All rights reserved..
»
↓↓↓ APERÇU DU DOCUMENT ↓↓↓